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Shiseido Earns Patent



Published November 14, 2005
Related Searches: composition anti skin patent
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Shiseido Earns Patent
For Antiseptic Skin Agent
l Patent No. US 6,620,418 B1: Shiseido Company, Ltd., Tokyo, Japan, patented a skin treatment with an antiseptic/ antifungal endermic liniment composition containing 3-methyl-3-methoxybutanol and 1,2-pentanediol as an antimicrobial/antibacterial agent.


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