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Organic Residue Remover



Published April 4, 2013
Related Searches: composition Surfactant patent mix
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US Patent No. 8,394,751 B2; W. M. Barr & Company, Memphis, TN, has patented a organic residue remover composition.

The composition is obtained by mixing at least one water insoluble hydrophobic compound; at least one water soluble glycol ether, at least one water insoluble glycol ether; at least one aromatic alcohol; at least one surfactant; optionally at least one hydrotrope; and water.


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