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November 22, 2005
By: TOM BRANNA
Editor
Patent No. US 6,749,643 B2: Shin-Etsu Chemical Co., Ltd., Tokyo, Japan, patented a fabric dry cleaning method that involves immersing or soaking the fabric with a dry cleaning solvent consisting of methyl tris(trimethylsiloxy) silane and a petroleum-based hydrocarbon solvent to dissolve dirt, removing the dry cleaning solvent and drying the wet fabric material with the dry cleaning solvent.
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