US Patent No. 9,968,542 B2; Shiseido Company Ltd.
, Tokyo, has patented a makeup method that is comprised of applying a makeup base to skin, applying a makeup cosmetic over the makeup base, and removing the makeup cosmetic together with the makeup base, by rubbing the skin with warm water (38-45°C) to remove the makeup cosmetic and the makeup base.
The makeup base is comprised of a water-containing aqueous phase as a continuous phase. The water-containing aqueous phase contains vinyl acetate polymer, polyhydric alcohol and hydrophilic nonionic surfactant.